Targeted Sputtering Strategies for High-Performance Superconducting Thin Films
The scalability and performance of next-generation superconducting circuits depend heavily on the precision of thin-film deposition. This talk explores how advanced magnetron sputtering techniques are being used to improve the efficiency and manufacturability of high-performance superconducting films. We will discuss optimized sputtering strategies for key materials—titanium nitride (TiN), tantalum, and niobium—with particular emphasis on substrate selection, power delivery, and temperature control. A comparative analysis of reactive sputtering for TiN will demonstrate how different sputtering approaches and reactive gas concentrations influence film stoichiometry. Experimental results will also be presented, highlighting the relationship between deposition parameters and superconducting performance, including improvements in critical temperature (Tc).
Key Highlights
- Material-specific sputtering strategies for TiN, Ta, and Nb
- The role of thermal management and reactive gas control in film quality
- Data-driven insights linking stoichiometry to superconducting performance
Speaker Bio
Stan Amyotte earned a Bachelor’s degree in Materials Chemistry from the University of Windsor in 2011 and has been active in the thin-film physical vapor deposition community since then. He co-founded Substrata Thin Film Solutions, serving as Vice President from 2013 to 2017, before the company was acquired by Angstrom Engineering. He is currently a Thin Film Coatings Manager at Angstrom Engineering, leading thin-film coating and process development efforts.